Surface Reaction in a 2-D Axisymmetric Reactor

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This tutorial investigates the etching of an Aluminum surface due to Chlorine gas when a mixture of Argon (Ar) and Chlorine (Cl2) flows over an Aluminum substrate. Similiar reactors are used in semiconductor fabrication and MEMS applications.


This tutorial will assist the user to do the following:

  • Set the model name and title.
  • Import a DTF grid.
  • Define a mixture and mixture properties.
  • Define a surface reaction mechanism.
  • Set fluid and solid properties using volume conditions.
  • Set boundary conditions and initial conditions.
  • Set solution and output parameters.

Download the file(s) 1.57 MB