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CFD-TOPO: A Tool for Feature Scale Simulation of Semiconductor Processes
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CFD-TOPO
CFD
by Abraham Meganathan
|24 July 2006
CFD-TOPO is a simulation tool that predicts how the shape of entities change due to the combined effects of chemical species transport and surface reactions at gas-solid interfaces. This application provides a wide array of tools to analyze the steps of a semiconductor process on the feature scale of a device (typically the order of micro-meter).